Deh-Ming Shyu: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Optical Engineering + Applications - San Diego, CA (Sunday 2 August 2009)] Optical Inspection and Metrology for Non-Optics Industries - A novel method for overlay measurement by scatterometry

Hsu, Wei-Te, Ku, Yi-Sha, Shyu, Deh-Ming, Huang, Peisen S., Yoshizawa, Toru, Harding, Kevin G.

Year:

2009

Language:

english

File:

PDF, 4.07 MB

english, 2009

2

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Measurement of through silicon via etch profile by dark-field optical microscope

Shyu, Deh-Ming, Ku, Yi-sha, Starikov, Alexander

Year:

2012

Language:

english

File:

PDF, 2.56 MB

english, 2012

3

SPIE Proceedings [SPIE SPIE Optical Metrology 2013 - Munich, Germany (Monday 13 May 2013)] Optical Measurement Systems for Industrial Inspection VIII - Infrared differential interference contrast microscopy for overlay metrology on 3D-interconnect bonded wafers

Ku, Yi-sha, Lehmann, Peter H., Osten, Wolfgang, Shyu, Deh-Ming, Lin, Yeou-Sung, Albertazzi, Armando, Cho, Chia-Hung

Year:

2013

Language:

english

File:

PDF, 432 KB

english, 2013

4

Scatterometry-based metrology with feature region signatures matching

Ku, Yi-Sha, Wang, Shih-Chun, Shyu, Deh-Ming, Smith, Nigel

Journal:

Year:

2006

Language:

english

File:

PDF, 568 KB

english, 2006

5

Analysis of Abruptly-bent Ridge Ti:LiNbO3 Waveguides by Beam Propagation Method Involving the Runge-Kutta Algorithm

Lee, Keh-Yi, Shyu, Deh-Ming, Wang, Ming-Haw, Jong, Yeang-Yih

Journal:

Journal of Optical Communications

Year:

1999

Language:

english

File:

PDF, 377 KB

english, 1999

6

Infrared differential interference contrast microscopy for 3D interconnect overlay metrology

Ku, Yi-sha, Shyu, Deh-Ming, Lin, Yeou-Sung, Cho, Chia-Hung

Journal:

Year:

2013

Language:

english

File:

PDF, 1.79 MB

english, 2013

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Angle-resolved scatterfield microscope for linewidth measurement

Shyu, Deh-Ming, Allgair, John A., Raymond, Christopher J., Ku, Yi-sha, Hsu, Wei-Te

Year:

2009

Language:

english

File:

PDF, 1.60 MB

english, 2009

8

Retinoid Acid Inhibits IL-1-Induced iNOS, COX-2 and Chemokine Production in Human Chondrocytes

Hung, Li-Feng, Lai, Jenn-Haung, Lin, Leou-Chyr, Wang, Shyu-Jye, Hou, Tsung-Yun, Chang, Deh-Ming, Liang, Chun-Chin T., Ho, Ling-Jun

Journal:

Immunological Investigations

Year:

2008

Language:

english

File:

PDF, 560 KB

english, 2008

9

Analysis of the through-focus images with boundary-element method in high resolution optical metrology

Shyu, Deh-Ming, Lu, Mao-Hong

Journal:

Review of Scientific Instruments

Year:

2006

Language:

english

File:

PDF, 716 KB

english, 2006

10

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Overlay measurement based on dual-overlay grating image

Shyu, Deh-Ming, Allgair, John A., Raymond, Christopher J., Ku, Yi-sha, Dong, Shu-Ping

Year:

2008

Language:

english

File:

PDF, 1.42 MB

english, 2008

11

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Angular scatterometry for line-width roughness measurement

Shyu, Deh-Ming, Archie, Chas N., Ku, Yi-Sha, Smith, Nigel

Year:

2007

Language:

english

File:

PDF, 1.17 MB

english, 2007

12

High-resolution through-focus metric with two-pitch grating target

Deh-Ming Shyu, Mao-Hong Lu, Chun-Hung Ko

Journal:

Optics Communications

Year:

2007

Language:

english

File:

PDF, 588 KB

english, 2007

13

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Influence of semiconductor manufacturing process variation on device parameter measurement for angular scatterometry

Wang, Shih-Chun, Archie, Chas N., Ku, Yi-Sha, Shyu, Deh-Ming, Ko, Chun-Hung, Smith, Nigel

Year:

2006

Language:

english

File:

PDF, 307 KB

english, 2006

14

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, CA (Sunday 2 August 2009)] Instrumentation, Metrology, and Standards for Nanomanufacturing III - Improved diffraction-based overlay metrology by use of two dimensional array target

Ku, Yi-Sha, Postek, Michael T., Allgair, John A., Pang, Hsiu-Lan, Hsu, Weite, Shyu, Deh-Ming

Year:

2009

Language:

english

File:

PDF, 537 KB

english, 2009

15

Overlay metrological system for overlaid linear gratings by an interferoscatterometer

Shyu, Deh-Ming, Lu, Mao-Hong

Journal:

Review of Scientific Instruments

Year:

2005

Language:

english

File:

PDF, 519 KB

english, 2005

16

A Novel Structure of the Beam Splitter Based on Multiple-Waveguide Couplers

Lee, Keh-Yi, Shyu, Deh-Ming, Juang, Rong-Terng, Huang, Chih-Feng, Wang, Ming-Haw

Journal:

Journal of Optical Communications

Year:

1999

Language:

english

File:

PDF, 772 KB

english, 1999

17

Usefulness of anti-CCP antibodies in patients with hepatitis C virus infection with or without arthritis, rheumatoid factor, or cryoglobulinemia

Feng-Cheng Liu, You-Chen Chao, Tsung-Yun Hou, Hsiang-Cheng Chen, Rong-Yaun Shyu, Tsai-Yuan Hsieh, Chen-Hung Chen, Deh-Ming Chang, Jenn-Haung Lai

Journal:

Clinical Rheumatology

Year:

2008

Language:

english

File:

PDF, 99 KB

english, 2008

18

Retinoic acid blocks pro-inflammatory cytokine-induced matrix metalloproteinase production by down-regulating JNK-AP-1 signaling in human chondrocytes

Ling-Jun Ho, Leou-Chyr Lin, Li-Feng Hung, Shyu-Jye Wang, Chian-Her Lee, Deh-Ming Chang, Jenn-Haung Lai, Tong-Yuan Tai

Journal:

Biochemical Pharmacology

Year:

2005

Language:

english

File:

PDF, 408 KB

english, 2005

19

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Comparisons of overlay measurement using conventional bright-field microscope and angular scatterometer

Ko, Chun-Hung, Silver, Richard M., Ku, Yi-sha, Smith, Nigel, Shyu, Deh-Ming, Wang, Shih-Chun, Lu, Sheng-Hua

Year:

2005

Language:

english

File:

PDF, 631 KB

english, 2005

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